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首页 > Products > Glove Box Thermal Evaporation System Glove-Box Thermal Evaporator with Multi Chambers
详细信息 Product Name: Glove Box Thermal Evaporation System Glove-Box Thermal Evaporator with Multi Chambers Model NO.: Customize Type: Thermal Resistance Application: School, Lab Certification: ISO Material: Stainless Steel Structure: Box Customized: Customized Trademark: Technol Transport Package: Export Wooden Box Specification: Customize Origin: China HS Code: 8486202200 Product Description Introductions:*Dual / Multiple Chamber of thin film deposition system and glove box system that can be used in an inert gas-protected environment for loading, replacing, taking out of substrate or material and so on works. The working environment of the inert gas and the oil-free vacuum system allow the coating equipment to reach the high vacuum environment faster.*The equipment can be composed by dual/multiple chambers of thermal evaporator and/or magnetron sputtering system, the combination of configuration is flexible and with single layer evaporation, multi-source co-evaporation, separated layer coating and so on functions.*The organic combination of evaporation/magnetron sputtering coating and glove box environment can achieve evaporation/magnetron sputtering, encapsulation, testing and other processes seamless docking, widely used in organic and inorganic perovskite solar cell, lithium battery, OLED thin film and other research systems, also can be used in nano-thin film optoelectronic devices preparation and production line of pre-process testing.* Suitable for plating low melting point metal and alloy material film, single layer / multi-layer / composite film, such as: copper, aluminum, gold, silver, barium, bismuth, zinc, antimony, etc.. Suitable for solar cells, LED research and experiment; Suitable for evaporation of organic materials and so on; Suitable for the plating of non-metallic / compound and so on material thin film, such as: molybdenum oxide, lithium fluoride, etc.; Suitable for sample preparation of scanning electron microscope, etc..Technical Parameters:Equipment Name: Thermal Evaporator/ Magnetron Sputtering System with Glove-boxModel: ZHDS400Coating Method: Multi-source evaporation coating/Multi-gun magnetron sputtering coatingChamber Structure: CustomizeChamber Size: CustomizeBaking Temperature: CustomizeRotating Substrate Holder: CustomizeSubstrate Holder Lift: CustomizeFilm Thickness Nonuniformity: ≤±5.0%Evaporation Source: CustomizeControl Method: PLC controlOccupied Area: CustomizeOptional: Air cooled chiller, film thickness monitor, air compressor
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