Beijing Technol Science Co., Ltd.  

Product Name: Integrated Multi-Source Thermal Evaporation System Thermal Evaporator for Laboratory Model NO.: ZHD400-I Type: Thermal Resistance Application: School, Lab Certification: ISO Material: Stainless Steel Structure: Box Customized: Customized Trademark: Technol Transport Package: Export Wooden Box Origin: China HS Code: 8486202200 Product Description Introductions:* ZHD400 High Vacuum Thermal Evaporator is equipped with 4~6 groups of evaporation sources (including of 2~3 groups of metal sources and 2~3 groups of organic sources), suitable for laboratory preparation of metal mono film, semiconductor film, perovskite solar cell, lithium battery, organic film and so on, also can be used for teaching and pre-production process test, etc..* The equipment is Integrated with the mainframeand the PLC touch screen control, easy to operate with compact structure and small footprint. * It is widely used in teaching and research experiments in universities & colleges and research institutes, as well as early exploration experiments and development of new products by manufacturing companies, and has been well received by users.* Suitable for plating low melting point metal and alloy material film, single layer / multi-layer / composite film, such as: copper, aluminum, gold, silver, barium, bismuth, zinc, antimony, etc.. Suitable for solar cells, LED research and experiment; Suitable for evaporation of organic materials and so on; Suitable for the plating of non-metallic / compound and so on material thin film, such as: molybdenum oxide, lithium fluoride, etc.; Suitable for sample preparation of scanning electron microscope, etc..Technical Parameters:Equipment Name: Thermal EvaporatorModel: ZHD400-ICoating Method: Multi-source evaporation coatingChamber Structure: Box-type front door structureChamber Size: L400×W440×H450mmBaking Temperature: Room temperature to 300ºCRotating Substrate Holder: 120mm×120mmSubstrate Holder Lift: Manually adjust the lifting height between 0-80mmFilm Thickness Nonuniformity: ≤±5.0%Evaporation Source: 2~3 Groups of metal sources, 2~3 Groups of organic sourcesControl Method: PLC controlOccupied Area: (Mainframe) L1750×W850×H1910mmPower: ≥8kWOptional: Air cooled chiller, film thickness monitor, air compressor